{"id":333,"date":"2019-05-31T15:57:03","date_gmt":"2019-05-31T20:57:03","guid":{"rendered":"http:\/\/www.nano-blog.com\/?p=333"},"modified":"2022-09-02T12:57:51","modified_gmt":"2022-09-02T17:57:51","slug":"a-coming-disruption-in-technology-part-1","status":"publish","type":"post","link":"http:\/\/www.nano-blog.com\/?p=333","title":{"rendered":"A coming disruption in technology? Part 1"},"content":{"rendered":"\n<p>There have been many years since the 1998 announcement of\ncarbon nanotube transistors.&nbsp; The hope\nhas been for the semiconductor industry to create a means of producing a carbon\nnanotube computer.&nbsp; First, why is there a\nneed to replace the current semiconductor manufacturing process?&nbsp; The ability to reduce the minimum feature\nsize dimension by 30% has been occurring on re regular basis of 18 to 24 months\nfor decades.&nbsp; A 30% reduction results in\nthe dimension shrinking to 70% of the previous size.&nbsp; With both length and width shrinking 70%, the\nare required is 49% of the previous area.&nbsp;\nConsequently, twice as many features can be fabricated in the same area\nas previously possible.&nbsp; <\/p>\n\n\n\n<p>The imaging process (lithography) is limited by the minimum\nfeature size possible from the source that produces the images.&nbsp; Lithography tools produce images that have\nmuch greater precision than the best photographic lenses available today.&nbsp; In addition to the high precision of the\nlithography equipment, there are a number of optical tweaks that can further\nrefine the image quality.&nbsp; There is a\nphysical limit on how far engineering can push the physical limits of imaging.&nbsp; Optical lithography went from visible\nwavelength to ultraviolet wavelengths (shorter wavelengths) and then to even\nshorter wavelengths.&nbsp; The current latest\nlithography tools employ a wavelength of 13.5 nanometers (nm).&nbsp; This is being used to produce images that\nhave one of their dimensions under 10nm.&nbsp;\n(If interested in further reading on the latest processes, please see\nreference #1.)<\/p>\n\n\n\n<p>There are challenges as the dimensions shrink.&nbsp; Multiple process steps require higher\nprecision equipment and more costly steps.&nbsp;\nAdditional manufacturing steps increase the amount of time required to\nmanufacture the semiconductors.&nbsp; Additional\nsteps also provided opportunities for decreasing the yields of the final\ndevices.&nbsp; All of this raises cost.<\/p>\n\n\n\n<p>As dimensions shrink, there is potential for unwanted\nelectrical characteristics to become present.&nbsp;\nThis degrades the performance of the devices.&nbsp; As the size shrinks and more electronics\ncircuitry is incorporated, the total distance the signals must travel in a\ndevice increases.&nbsp; There are some\nestimates that 50% of the power for the leading edge devices is used to move\nthe electrical signals through the circuitry.&nbsp;\n<\/p>\n\n\n\n<p>Why does the industry continue on as it has in the\npast?&nbsp; Currently, there is nothing else\nthat can produce billions of connected transistors every second.<\/p>\n\n\n\n<p>According to a C&amp;EN article (Ref. 2), DARPA is\ninterested in carbon nanotube circuits.&nbsp; There\nare a number of methods to apply the nanotubes into circuitry that will provide\nbetter performance with lower power consumption.&nbsp; One of the challenges mentioned in the\narticle is the caution needed in handling some of the exotic materials within\nthe clean space required for semiconductor manufacturing.&nbsp;&nbsp;&nbsp; Many materials can have very detrimental\nimpacts of the production process.&nbsp; <\/p>\n\n\n\n<p>Back in the 1990s, the Advanced Technology Development\nFacility of SEMATECH instituted a process where they could annually handle as\nmany as 40 different exotic and potentially process disastrous materials\nwithout danger of contamination.<\/p>\n\n\n\n<p>The process for producing the carbon nanotubes requires a\nseed for growth of the tubes.&nbsp; Typically,\nthe seed material is one that should not be permitted to be the clean environment\nof semiconductor manufacturing.&nbsp; It can\nbe done correctly and provide the safety controls required to manufacture the semiconductors.<\/p>\n\n\n\n<p>Part 2 will cover the possible types of transistor designs\nunder consideration and some of the issues in implementing them into existing\nmanufacturing.<\/p>\n\n\n\n<p>References:<\/p>\n\n\n\n<ol class=\"wp-block-list\"><li><a href=\"https:\/\/spectrum.ieee.org\/semiconductors\/nanotechnology\/euv-lithography-finally-ready-for-chip-manufacturing\">https:\/\/spectrum.ieee.org\/semiconductors\/nanotechnology\/euv-lithography-finally-ready-for-chip-manufacturing<\/a>\n<\/li><li><a href=\"https:\/\/cen.acs.org\/materials\/electronic-materials\/Carbon-nanotube-computers-face-makebreak\/97\/i8\">https:\/\/cen.acs.org\/materials\/electronic-materials\/Carbon-nanotube-computers-face-makebreak\/97\/i8<\/a>\n<\/li><\/ol>\n","protected":false},"excerpt":{"rendered":"<p>There have been many years since the 1998 announcement of carbon nanotube transistors.&nbsp; The hope has been for the semiconductor industry to create a means of producing a [..]<\/p>\n","protected":false},"author":1,"featured_media":0,"comment_status":"open","ping_status":"open","sticky":false,"template":"","format":"standard","meta":{"footnotes":""},"categories":[9,10],"tags":[],"class_list":["post-333","post","type-post","status-publish","format-standard","hentry","category-nano","category-semiconductor-technology"],"_links":{"self":[{"href":"http:\/\/www.nano-blog.com\/index.php?rest_route=\/wp\/v2\/posts\/333","targetHints":{"allow":["GET"]}}],"collection":[{"href":"http:\/\/www.nano-blog.com\/index.php?rest_route=\/wp\/v2\/posts"}],"about":[{"href":"http:\/\/www.nano-blog.com\/index.php?rest_route=\/wp\/v2\/types\/post"}],"author":[{"embeddable":true,"href":"http:\/\/www.nano-blog.com\/index.php?rest_route=\/wp\/v2\/users\/1"}],"replies":[{"embeddable":true,"href":"http:\/\/www.nano-blog.com\/index.php?rest_route=%2Fwp%2Fv2%2Fcomments&post=333"}],"version-history":[{"count":1,"href":"http:\/\/www.nano-blog.com\/index.php?rest_route=\/wp\/v2\/posts\/333\/revisions"}],"predecessor-version":[{"id":334,"href":"http:\/\/www.nano-blog.com\/index.php?rest_route=\/wp\/v2\/posts\/333\/revisions\/334"}],"wp:attachment":[{"href":"http:\/\/www.nano-blog.com\/index.php?rest_route=%2Fwp%2Fv2%2Fmedia&parent=333"}],"wp:term":[{"taxonomy":"category","embeddable":true,"href":"http:\/\/www.nano-blog.com\/index.php?rest_route=%2Fwp%2Fv2%2Fcategories&post=333"},{"taxonomy":"post_tag","embeddable":true,"href":"http:\/\/www.nano-blog.com\/index.php?rest_route=%2Fwp%2Fv2%2Ftags&post=333"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}